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The [course_title] describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy. The course begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence, then goes on to examine a broad range of phenomena and applications.
Assessment
This course does not involve any written exams. Students need to answer 5 assignment questions to complete the course, the answers will be in the form of written work in pdf or word. Students can write the answers in their own time. Each answer needs to be 200 words (1 Page). Once the answers are submitted, the tutor will check and assess the work.
Certification
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Course Credit: Open Culture
Course Curriculum
Module 01 | |||
AST 210/EE 213 – Lecture 1: Introduction, part A | 01:19:00 | ||
AST 210/EE 213 – Lecture 2: Introduction, part B | 01:21:00 | ||
AST 210/EE 213 – Lecture 3: X-ray interaction with matter | 01:20:00 | ||
AST 210/EE 213 – Lecture 4: Radiation by an accelerated… | 01:20:00 | ||
AST 210/EE 213 – Lecture 5: X-ray scattering by a multi-… | 01:22:00 | ||
AST 210/EE 213 – Lecture 6: X-ray refractive index; … | 01:16:00 | ||
AST 210/EE 213 – Lecture 7: Brewster’s angle; Multilayer … | 01:19:00 | ||
Module 02 | |||
AST 210/EE 213 – Lecture 8: Multilayer applications | 01:25:00 | ||
AST 210/EE 213 – Lecture 9: Synchrotron radiation | 01:24:00 | ||
AST 210/EE 213 – Lecture 10: Bending magnet radiation | 01:18:00 | ||
AST 210/EE 213 – Lecture 11: Undulator radiation | 01:25:00 | ||
AST 210/EE 213 – Lecture 12: Undulator brightness and… | 01:27:00 | ||
AST 210/EE 213 – Lecture 13: Plasma physics | 01:24:00 | ||
AST 210/EE 213 – Lecture 14: Plasma physics (continued) | 01:20:00 | ||
Module 03 | |||
AST 210/EE 213 – Lecture 15: Plasma waves | 01:20:00 | ||
AST 210/EE 213 – Lecture 16: Blackbody radiation | 01:23:00 | ||
AST 210/EE 213 – Lecture 17: High harmonic generation | 01:24:00 | ||
AST 210/EE 213 – Lecture 18: Lasers | 01:20:00 | ||
AST 210/EE 213 – Lecture 19: EUV and soft x-ray lasers | 01:24:00 | ||
AST 210/EE 213 – Lecture 20: Laser wavelength scaling | 00:52:00 | ||
AST 210/EE 213 – Lecture 21: Coherence, spatial and temporal | 01:20:00 | ||
Module 04 | |||
AST 210/EE 213 – Lecture 22: Coherent undulator radiation | 00:46:00 | ||
AST 210/EE 213 – Lecture 23: van Cittert-Zernike Theorem | 01:23:00 | ||
AST 210/EE 213 – Lecture 24: Coherence. Zone plate… | 01:23:00 | ||
AST 210/EE 213 – Lecture 25: Zone plate imaging and… | 01:19:00 | ||
AST 210/EE 213 – Lecture 26: Spatial resolution and depth… | 01:21:00 | ||
AST 210/EE 213 – Lecture 27: Applications of zone plate… | 01:11:00 | ||
AST 210/EE 213 – Lecture 28: EUV lithography | 01:05:00 | ||
Assessment | |||
Submit Your Assignment | 00:00:00 | ||
Certification | 00:00:00 |
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